• Monitoring Dissolved Ozone Concentration in Semiconductor Wet Benches Using the 470
    ​Ozone is a versatile oxidizer and is commonly used in semiconductor wet bench applications for cleaning, particle and photoresist removal. There are several advantages to using ozone in these applications including: reduced use of harmful chemicals such as hydrofluoric acid, minimization of typical chemical waste used in mentioned process, increased cleaning and efficiencies. As the complexity of semiconductor wafer structures increases, the use of ozone will continue to play an important role in the manufacturing processes of those wafers. To fully realize the potential of the advantages, it is important to be able to measure the concentration of ozone present or injected in the process. Therefore an in-line ozone concentration monitor is required for careful control of the amount ​of dissolved ozone in a liquid.

    The Teledyne API (TAPI) 470 Dissolved Ozone Analyzer is designed to be an in-line sensor that requires minimal maintenance and can be seamlessly integrated into a wet bench system. In-line monitoring of the concentration of dissolved ozone is the preferred method of measurement over slip stream or side stream monitoring. Slip stream or side stream monitoring requires additional valves, piping and sensors that can fail or create other problems within a wet bench system, such as receiving a concentration measurement that is not representative of the process liquid. With in-line monitoring, you always get a true measurement of the concentration of dissolved ozone in the process liquid. The monitor can also be easily spliced into an existing system. Since wet bench ozone included processes require specific levels of ozone, it’s extremely important to use an in-line sensor.