OG-5000 Series

  High Purity Water Cooled Ozone Generator​​


  • ​High purity ozone
  • High ozone concentrations
  • Low cost of ownership
  • No consumables
  • Compact and modular
  • Proven technology


Maintenance section coming soon.  ​


ESD Fundamentals - 04786.pdfFundamentals of Electro-Static Discharge (ESD)216 KB
OG50000.pdfOG5000 Manual529 KB
OG-B-1-S Model 5000 Addendum - 1106.pdfOG5000 Manual Addendum for Model OG-B-1-S56 KB
SAL000099B - OG-5000 Web.pdfOG-5000 Specification3073 KB
SAL000099B-CN OG-5000.pdfOG-5000规格 (Chinese Specification)2783 KB


Maximum Ozone Production 

​OG-5000-A   210 g/hr​

​​ Interface
          Control Interface
          Remote Control

Front panel or automatic remote control
Remote on/off

​​Feed Gas 

Oxygen Grade: Grade 6 or better
Nitrogen for doping only: Grade 5 or better (0.5% only)
Feed gas flow rate: 0.5 to 20 slpm

​Operating Conditions

Ozone Outlet Pressure
Operating Ambient Temperature
Cooling Water Temperature
Cooling Water Flow
Cooling Water Quality


15 to 40 psig (typically set to 30 psig)
18°C + 2°C
2.5 GPM
Demineralized Cooling Fab Water

​​​ Power

208/240 VAC 1 Phase or 3 Phase
50 or 60 Hz
20 A 1ф or 15 A 3ф​
​​​​​ Physical Specifications
          Dimensions (WxHxD)

19" x 10.5" x 18" (48 cm x 27 cm x 45 cm)
82 lbs. (37 kg)​
​​ Compliance
1 year​



  • Semiconductor
    • Chemical Vapor Deposition (CVD)
    • Atomic Layer Deposition (ALD)
    • Oxide growth
    • Surface conditioning
    • Particle cleaning
    • Photoresist removal
    • Ashing
    • Others​


The OG-5000 series of ozone generators is designed to produce high concentrations of ultra clean ozone gas for use in semiconductor applications including CVD, ALD thin film, oxide growth and wet bench cleaning processes.

​The OG-5000 series has a compact, water cooled design that can be easily integrated with Teledyne API’s ozone system controller, ozone leak detectors, ozone concentration monitors and ozone destructs. Its proven technology makes it ideal for a wide range of semiconductor process applications.